BEAM maskless lithography product lineup
NANYTE BEAM is a compact desktop UV direct-write lithography system for labs that need maskless patterning for photonics, MEMS, microfluidics, micro-optics, metamaterials, grayscale lithography, and rapid prototyping.
BEAM
Benchtop maskless lithography system for direct digital patterning without photomasks.
Lite / Standard / Advanced
Configurable optics engines including dual 365 + 405 nm exposure options for different resist needs.
Advanced BEAM Workflows
16-bit grayscale exposure for smooth 3D structures, micro-optics, blazed gratings, and relief patterns.
Tell us your lithography requirement.
Share your target feature size, substrate size, resist, wavelength sensitivity, grayscale requirement, overlay needs, and application. HX Technology can help identify the right BEAM configuration.